EXTREME UV AND X-RAY-SCATTERING MEASUREMENTS FROM A ROUGH LIF CRYSTAL-SURFACE CHARACTERIZED BY ELECTRON MICROGRAPHY

被引：7

作者：

ALEHYANE, N

ARBAOUI, M

BARCHEWITZ, R

ANDRE, JM

CHRISTENSEN, FE

HORNSTRUP, A

PALMARI, J

RASIGNI, M

RIVOIRA, R

RASIGNI, G

机构：

[1] DANISH SPACE RES INST,DK-2800 LYNGBY,DENMARK

[2] UNIV AIX MARSEILLE 3,DEPT PHYS INTERACT PHOTONS MATIERE,F-13397 MARSEILLE 04,FRANCE

来源：

APPLIED OPTICS | 1989年 / 28卷 / 10期

关键词：

D O I：

10.1364/AO.28.001763

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

引用

页码：1763 / 1772

页数：10

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