INTERNAL PHOTOEMISSION MECHANISMS AT INTERFACES BETWEEN GERMANIUM AND THIN METAL-FILMS

被引：31

作者：

CHAN, EY

CARD, HC

TEICH, MC

机构：

[1] COLUMBIA UNIV,RADIAT LAB,NEW YORK,NY 10027

[2] COLUMBIA UNIV,DEPT ELECT ENGN,NEW YORK,NY 10027

[3] WESTERN ELECT CO INC,ENGN RES CTR,PRINCETON,NJ 08540

来源：

关键词：

D O I：

10.1109/JQE.1980.1070476

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：373 / 381

页数：9

共 14 条

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CARD, HC
[J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1980, 27 (01) : 78 - 83
[3] CHAN EY, UNPUBLISHED
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