SELF-MASKING SELECTIVE EPITAXY BY MOLECULAR-BEAM METHOD

被引：88

作者：

NAGATA, S ^{[1
]}

TANAKA, T ^{[1
]}

机构：

[1] MATSUSHITA ELECT IND CO LTD, CENT RES LABS, MORIGUCHI, OSAKA 570, JAPAN

来源：

JOURNAL OF APPLIED PHYSICS | 1977年 / 48卷 / 03期

关键词：

D O I：

10.1063/1.323712

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：940 / 942

页数：3

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