4-METHYL-1,2,3-SELENADIAZOLE - A LIQUID SELENIUM SOURCE FOR THE LOW-TEMPERATURE CHEMICAL VAPOR-DEPOSITION OF SELENIUM-CONTAINING MATERIALS

被引:3
作者
JACKSON, AD [1 ]
JONES, PA [1 ]
LICKISS, PD [1 ]
PILKINGTON, RD [1 ]
机构
[1] UNIV SALFORD,DEPT ELECTR & ELECT ENGN,SALFORD M5 4WT,LANCS,ENGLAND
关键词
SELENADIAZOLE; SELENIUM; CHEMICAL VAPOR DEPOSITION; PLASMA-ASSISTED CHEMICAL VAPOR DEPOSITION;
D O I
10.1039/jm9930300429
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The use of 4-methyl-1,2,3-selenadiazole as a precursor for the chemical vapour deposition of selenium-containing materials has been investigated. The results indicate that this is a useful precursor for the low-temperature plasma-assisted chemical vapour deposition of selenium, with a growth rate of 500 angstrom min-1 being achieved with a substrate temperature of 40-degrees-C and a plasma power density of 1 W cm-2.
引用
收藏
页码:429 / 430
页数:2
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