ION-BEAM CRYSTALLOGRAPHY OF CLEAN AND SULFUR COVERED NI(100)

被引:74
作者
VANDERVEEN, JF
TROMP, RM
SMEENK, RG
SARIS, FW
机构
[1] FOM-Institute for Atomic and Molecular Physics, Amsterdam/Wgm.
关键词
D O I
10.1016/0039-6028(79)90204-8
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Medium energy ion scattering has been used to determine the atomic structure of a Ni(110) surface covered with 0.5 monolayer of sulfur. After having confirmed that the sulfur atom resides in a fourfold-coordinated hollow site, it was found that its distance above the plane of the first Ni layer is 0.87 ± 0.03 Å. We measured a 6 ± 3% outward relaxation effect for the sulfur covered Ni(110) surface layer and an inward relaxation of 4 ± 1% when this surface is clean. © 1979.
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页码:468 / 480
页数:13
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