DIAMOND FILM GROWTH ON TI-IMPLANTED GLASSY-CARBON

被引：4

作者：

BREWER, MA

BROWN, IG

EVANS, PJ

HOFFMAN, A

机构：

[1] LAWRENCE BERKELEY LAB,BERKELEY,CA 94720

[2] ANSTO LUCAS HGTS RES LABS,MENAI,NSW 2234,AUSTRALIA

来源：

APPLIED PHYSICS LETTERS | 1993年 / 63卷 / 12期

关键词：

D O I：

10.1063/1.110718

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The growth of diamond thin films on glassy carbon substrates has been investigated as a function of deposition time for different surface treatments. Implantation of Ti to a dose of 1.7 X 10(17) cm-2 and abrasion with diamond powder have both been examined to determine their effect on film nucleation and growth. At the shorter deposition times studied, diamond nucleation was observed on all test samples with those subjected to the abrasive pretreatment exhibiting the higher growth rates. However, the adhesion and uniformity of films on unimplanted glassy carbon were found to deteriorate significantly following deposition runs of 14 and 21 h duration. This was attributed to a destabilization of the underlying surface caused by plasma erosion.

引用

页码：1631 / 1633

页数：3

共 21 条

[1]

Bachmann P. K., 1990, Advanced Materials, V2, P195, DOI 10.1002/adma.19900020410

[2] DIAMOND FILM NUCLEATION AND INTERFACE CHARACTERIZATION [J].

BOU, P ;

VANDENBULCKE, L ;

HERBIN, R ;

HILLION, F .

JOURNAL OF MATERIALS RESEARCH, 1992, 7 (08) :2151-2159

[3] SIMPLE, SAFE, AND ECONOMICAL MICROWAVE PLASMA-ASSISTED CHEMICAL VAPOR-DEPOSITION FACILITY [J].

BREWER, MA ;

BROWN, IG ;

DICKINSON, MR ;

GALVIN, JE ;

MACGILL, RA ;

SALVADORI, MC .

REVIEW OF SCIENTIFIC INSTRUMENTS, 1992, 63 (06) :3389-3393

[4] METAL VAPOR VACUUM-ARC ION-SOURCE [J].

BROWN, IG ;

GALVIN, JE ;

GAVIN, BF ;

MACGILL, RA .

REVIEW OF SCIENTIFIC INSTRUMENTS, 1986, 57 (06) :1069-1084

[5] INFLUENCE OF SUBSTRATE TOPOGRAPHY ON THE NUCLEATION OF DIAMOND THIN-FILMS [J].

DENNIG, PA ;

STEVENSON, DA .

APPLIED PHYSICS LETTERS, 1991, 59 (13) :1562-1564

[6] NUCLEATION OF DIAMOND ON SILICON, SIALON, AND GRAPHITE SUBSTRATES COATED WITH AN A-C-H LAYER [J].

DUBRAY, JJ ;

PANTANO, CG ;

MELONCELLI, M ;

BERTRAN, E .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1991, 9 (06) :3012-3018

[7]

DUBRAY JJ, 1991, J APPL PHY S, V72, P3136

[8] COMPACTION, DISTRIBUTION, AND CHEMICAL BONDING OF TUNGSTEN-IMPLANTED GLASSY-CARBON [J].

HOFFMAN, A ;

EVANS, PJ ;

COHEN, DD ;

PATERSON, PJK .

JOURNAL OF APPLIED PHYSICS, 1992, 72 (12) :5687-5694

[9] INHIBITION OF HYDROGEN PLASMA EROSION AND ENHANCEMENT IN WEAR-RESISTANCE OF TUNGSTEN IMPLANTED GLASSY-CARBON [J].

HOFFMAN, A ;

EVANS, PJ ;

COHEN, DD ;

CLISSOLD, R .

APPLIED PHYSICS LETTERS, 1992, 60 (17) :2077-2079

[10] SYNTHESIS OF A DIAMOND AND METAL MIXTURE BY THE CHEMICAL VAPOR-DEPOSITION PROCESS [J].

KAWARADA, M ;

KURIHARA, K ;

SASAKI, K .

JOURNAL OF APPLIED PHYSICS, 1992, 71 (03) :1442-1445

← 1 2 3 →