FORMATION OF THIN-FILM DIELECTRICS BY REMOTE PLASMA-ENHANCED CHEMICAL-VAPOR DEPOSITION (REMOTE PECVD)

被引：24

作者：

LUCOVSKY, G

TSU, DV

KIM, SS

MARKUNAS, RJ

FOUNTAIN, GG

机构：

[1] N CAROLINA STATE UNIV,DEPT MAT SCI & ENGN,RALEIGH,NC 27695

[2] RES TRIANGLE INST,SEMICOND RES DEPT,RES TRIANGLE PK,NC 27709

来源：

关键词：

D O I：

10.1016/0169-4332(89)90418-2

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：33 / 56

页数：24

共 32 条

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