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INFLUENCE OF PHOSPHORUS-INDUCED POINT-DEFECTS ON A GOLD-GETTERING MECHANISM IN SILICON
被引:29
作者
:
LECROSNIER, D
论文数:
0
引用数:
0
h-index:
0
机构:
INST UNIV TECHNOL LANNION,PHYS MAT LAB,F-22302 LANNION,FRANCE
INST UNIV TECHNOL LANNION,PHYS MAT LAB,F-22302 LANNION,FRANCE
LECROSNIER, D
[
1
]
PAUGAM, J
论文数:
0
引用数:
0
h-index:
0
机构:
INST UNIV TECHNOL LANNION,PHYS MAT LAB,F-22302 LANNION,FRANCE
INST UNIV TECHNOL LANNION,PHYS MAT LAB,F-22302 LANNION,FRANCE
PAUGAM, J
[
1
]
RICHOU, F
论文数:
0
引用数:
0
h-index:
0
机构:
INST UNIV TECHNOL LANNION,PHYS MAT LAB,F-22302 LANNION,FRANCE
INST UNIV TECHNOL LANNION,PHYS MAT LAB,F-22302 LANNION,FRANCE
RICHOU, F
[
1
]
PELOUS, G
论文数:
0
引用数:
0
h-index:
0
机构:
INST UNIV TECHNOL LANNION,PHYS MAT LAB,F-22302 LANNION,FRANCE
INST UNIV TECHNOL LANNION,PHYS MAT LAB,F-22302 LANNION,FRANCE
PELOUS, G
[
1
]
机构
:
[1]
INST UNIV TECHNOL LANNION,PHYS MAT LAB,F-22302 LANNION,FRANCE
来源
:
JOURNAL OF APPLIED PHYSICS
|
1980年
/ 51卷
/ 02期
关键词
:
D O I
:
10.1063/1.327732
中图分类号
:
O59 [应用物理学];
学科分类号
:
摘要
:
引用
收藏
页码:1036 / 1038
页数:3
相关论文
共 13 条
[1]
ELECTRICALLY ACTIVE STACKING-FAULTS IN CMOS INTEGRATED-CIRCUITS
DISHMAN, JM
论文数:
0
引用数:
0
h-index:
0
机构:
Bell Laboratories, Murray Hill
DISHMAN, JM
HASZKO, SE
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Bell Laboratories, Murray Hill
HASZKO, SE
MARCUS, RB
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Bell Laboratories, Murray Hill
MARCUS, RB
MURARKA, SP
论文数:
0
引用数:
0
h-index:
0
机构:
Bell Laboratories, Murray Hill
MURARKA, SP
SHENG, TT
论文数:
0
引用数:
0
h-index:
0
机构:
Bell Laboratories, Murray Hill
SHENG, TT
[J].
JOURNAL OF APPLIED PHYSICS,
1979,
50
(04)
: 2689
-
2696
[2]
QUANTITATIVE MODEL FOR DIFFUSION OF PHOSPHORUS IN SILICON AND EMITTER DIP EFFECT
FAIR, RB
论文数:
0
引用数:
0
h-index:
0
机构:
BELL LABS INC,READING,PA 19604
BELL LABS INC,READING,PA 19604
FAIR, RB
TSAI, JCC
论文数:
0
引用数:
0
h-index:
0
机构:
BELL LABS INC,READING,PA 19604
BELL LABS INC,READING,PA 19604
TSAI, JCC
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1977,
124
(07)
: 1107
-
1118
[3]
QUANTIFIED CONDITIONS FOR EMITTER-MISFIT DISLOCATION FORMATION IN SILICON
FAIR, RB
论文数:
0
引用数:
0
h-index:
0
FAIR, RB
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1978,
125
(06)
: 923
-
926
[4]
DIFFUSION OF GOLD IN THIN SILICON SLICES
HUNTLEY, FA
论文数:
0
引用数:
0
h-index:
0
HUNTLEY, FA
WILLOUGHBY, AF
论文数:
0
引用数:
0
h-index:
0
WILLOUGHBY, AF
[J].
SOLID-STATE ELECTRONICS,
1970,
13
(09)
: 1231
-
+
[5]
LONG-RANGE ENHANCEMENT OF BORON DIFFUSIVITY INDUCED BY A HIGH-SURFACE-CONCENTRATION PHOSPHORUS DIFFUSION
LECROSNIER, D
论文数:
0
引用数:
0
h-index:
0
机构:
Centre National d'Etudes des Télécommunications
LECROSNIER, D
GAUNEAU, M
论文数:
0
引用数:
0
h-index:
0
机构:
Centre National d'Etudes des Télécommunications
GAUNEAU, M
PAUGAM, J
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0
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Centre National d'Etudes des Télécommunications
PAUGAM, J
PELOUS, G
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Centre National d'Etudes des Télécommunications
PELOUS, G
RICHOU, F
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0
引用数:
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0
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Centre National d'Etudes des Télécommunications
RICHOU, F
[J].
APPLIED PHYSICS LETTERS,
1979,
34
(03)
: 224
-
226
[6]
LECROSNIER D, 1978, I PHYS C SER, V46, P566
[7]
LECROSNIER D, UNPUBLISHED
[8]
NEW OBSERVATION OF ENHANCED DIFFUSION
LEE, DB
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0
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LEE, DB
WILLOUGHBY, AF
论文数:
0
引用数:
0
h-index:
0
WILLOUGHBY, AF
[J].
JOURNAL OF APPLIED PHYSICS,
1972,
43
(01)
: 245
-
+
[9]
PETROFF PM, 1977, SEMICONDUCTOR SILICO, V77
[10]
ELIMINATION OF OXIDATION-INDUCED STACKING-FAULTS BY PREOXIDATION GETTERING OF SILICON WAFERS .1. PHOSPHORUS DIFFUSION-INDUCED MISFIT DISLOCATIONS
ROZGONYI, GA
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,MURRAY HILL,NJ 07974
BELL TEL LABS INC,MURRAY HILL,NJ 07974
ROZGONYI, GA
PETROFF, PM
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,MURRAY HILL,NJ 07974
BELL TEL LABS INC,MURRAY HILL,NJ 07974
PETROFF, PM
READ, MH
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,MURRAY HILL,NJ 07974
BELL TEL LABS INC,MURRAY HILL,NJ 07974
READ, MH
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1975,
122
(12)
: 1725
-
1729
←
1
2
→
共 13 条
[1]
ELECTRICALLY ACTIVE STACKING-FAULTS IN CMOS INTEGRATED-CIRCUITS
DISHMAN, JM
论文数:
0
引用数:
0
h-index:
0
机构:
Bell Laboratories, Murray Hill
DISHMAN, JM
HASZKO, SE
论文数:
0
引用数:
0
h-index:
0
机构:
Bell Laboratories, Murray Hill
HASZKO, SE
MARCUS, RB
论文数:
0
引用数:
0
h-index:
0
机构:
Bell Laboratories, Murray Hill
MARCUS, RB
MURARKA, SP
论文数:
0
引用数:
0
h-index:
0
机构:
Bell Laboratories, Murray Hill
MURARKA, SP
SHENG, TT
论文数:
0
引用数:
0
h-index:
0
机构:
Bell Laboratories, Murray Hill
SHENG, TT
[J].
JOURNAL OF APPLIED PHYSICS,
1979,
50
(04)
: 2689
-
2696
[2]
QUANTITATIVE MODEL FOR DIFFUSION OF PHOSPHORUS IN SILICON AND EMITTER DIP EFFECT
FAIR, RB
论文数:
0
引用数:
0
h-index:
0
机构:
BELL LABS INC,READING,PA 19604
BELL LABS INC,READING,PA 19604
FAIR, RB
TSAI, JCC
论文数:
0
引用数:
0
h-index:
0
机构:
BELL LABS INC,READING,PA 19604
BELL LABS INC,READING,PA 19604
TSAI, JCC
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1977,
124
(07)
: 1107
-
1118
[3]
QUANTIFIED CONDITIONS FOR EMITTER-MISFIT DISLOCATION FORMATION IN SILICON
FAIR, RB
论文数:
0
引用数:
0
h-index:
0
FAIR, RB
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1978,
125
(06)
: 923
-
926
[4]
DIFFUSION OF GOLD IN THIN SILICON SLICES
HUNTLEY, FA
论文数:
0
引用数:
0
h-index:
0
HUNTLEY, FA
WILLOUGHBY, AF
论文数:
0
引用数:
0
h-index:
0
WILLOUGHBY, AF
[J].
SOLID-STATE ELECTRONICS,
1970,
13
(09)
: 1231
-
+
[5]
LONG-RANGE ENHANCEMENT OF BORON DIFFUSIVITY INDUCED BY A HIGH-SURFACE-CONCENTRATION PHOSPHORUS DIFFUSION
LECROSNIER, D
论文数:
0
引用数:
0
h-index:
0
机构:
Centre National d'Etudes des Télécommunications
LECROSNIER, D
GAUNEAU, M
论文数:
0
引用数:
0
h-index:
0
机构:
Centre National d'Etudes des Télécommunications
GAUNEAU, M
PAUGAM, J
论文数:
0
引用数:
0
h-index:
0
机构:
Centre National d'Etudes des Télécommunications
PAUGAM, J
PELOUS, G
论文数:
0
引用数:
0
h-index:
0
机构:
Centre National d'Etudes des Télécommunications
PELOUS, G
RICHOU, F
论文数:
0
引用数:
0
h-index:
0
机构:
Centre National d'Etudes des Télécommunications
RICHOU, F
[J].
APPLIED PHYSICS LETTERS,
1979,
34
(03)
: 224
-
226
[6]
LECROSNIER D, 1978, I PHYS C SER, V46, P566
[7]
LECROSNIER D, UNPUBLISHED
[8]
NEW OBSERVATION OF ENHANCED DIFFUSION
LEE, DB
论文数:
0
引用数:
0
h-index:
0
LEE, DB
WILLOUGHBY, AF
论文数:
0
引用数:
0
h-index:
0
WILLOUGHBY, AF
[J].
JOURNAL OF APPLIED PHYSICS,
1972,
43
(01)
: 245
-
+
[9]
PETROFF PM, 1977, SEMICONDUCTOR SILICO, V77
[10]
ELIMINATION OF OXIDATION-INDUCED STACKING-FAULTS BY PREOXIDATION GETTERING OF SILICON WAFERS .1. PHOSPHORUS DIFFUSION-INDUCED MISFIT DISLOCATIONS
ROZGONYI, GA
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,MURRAY HILL,NJ 07974
BELL TEL LABS INC,MURRAY HILL,NJ 07974
ROZGONYI, GA
PETROFF, PM
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,MURRAY HILL,NJ 07974
BELL TEL LABS INC,MURRAY HILL,NJ 07974
PETROFF, PM
READ, MH
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,MURRAY HILL,NJ 07974
BELL TEL LABS INC,MURRAY HILL,NJ 07974
READ, MH
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1975,
122
(12)
: 1725
-
1729
←
1
2
→