THIN FILM CHARACTERIZATION BY ELECTRON MICROPROBE AND ELLIPSOMETRY - SIO2 FILMS ON SILICON

被引：8

作者：

KNAUSENB.WH

VEDAM, K

WHITE, EW

ZEIGLER, W

机构：

[1] Materials Research Laboratory, Pennsylvania State University, University Park

来源：

APPLIED PHYSICS LETTERS | 1969年 / 14卷 / 02期

关键词：

D O I：

10.1063/1.1652704

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A combined electron microprobe and ellipsometric study of thin SiO 2 films on silicon provides a technique for compositional and morphological characterization of thin films. © 1969 The American Institute of Physics.

引用

页码：43 / &

共 12 条

[1] OPTICAL MEASUREMENT OF FILM GROWTH ON SILICON AND GERMANIUM SURFACES IN ROOM AIR [J].

ARCHER, RJ .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1957, 104 (10) :619-622

[2]

Drude P., 1889, ANN PHYS-NEW YORK, V272, P865

[3] SURFACE MEASUREMENTS ON FRESHLY CLEAVED SILICON PARA-NORMAL JUNCTIONS [J].

GOBELI, GW ;

ALLEN, FG .

JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1960, 14 :23-&

[4]

Heavens O. S., 1955, OPTICAL PROPERTIES T

[5]

MCKINLEY TD, 1966, 1964 P MICR S WAS ED

[6] CHANGES IN PHASE AND AMPLITUDE OF POLARIZED LIGHT REFLECTED FROM A FILM-COVERED SURFACE AND THEIR RELATIONS WITH FILM THICKNESS [J].

SAXENA, AN .

JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1965, 55 (09) :1061-&

[7]

Vasicek A., 1960, OPTICS THIN FILMS

[8] ELLIPSOMETRIC METHOD FOR DETERMINATION OF ALL OPTICAL PARAMETERS OF SYSTEM OF AN ISOTROPIC NONABSORBING FILM ON AN ISOTROPIC ABSORBING SUBSTRATE . OPTICAL CONSTANTS OF SILICON [J].

VEDAM, K ;

KNAUSENBERGER, W ;

LUKES, F .

JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1969, 59 (01) :64-+

[9] SIMULTANEOUS AND INDEPENDENT DETERMINATION OF REFRACTIVE INDEX AND THICKNESS OF THIN FILMS BY ELLIPSOMETRY [J].

VEDAM, K ;

RAI, R ;

LUKES, F ;

SRINIVASAN, R .

JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1968, 58 (04) :526-+

[10] SILICON VALENCE IN SIO FILMS STUDIED BY X-RAY EMISSION [J].

WHITE, EW ;

ROY, R .

SOLID STATE COMMUNICATIONS, 1964, 2 (06) :151-152

← 1 2 →