EFFECTS OF DEPOSITION TEMPERATURE AND SUBSTRATE BIAS ON ORIENTATION AND HARDNESS OF THICK SPUTTER DEPOSITED BERYLLIUM FOILS

被引：10

作者：

PATTEN, JW ^{[1
]}

MCCLANAHAN, ED ^{[1
]}

机构：

[1] BATTELLE NW INST, RICHLAND, WA 99352 USA

来源：

JOURNAL OF THE LESS-COMMON METALS | 1973年 / 30卷 / 03期

关键词：

D O I：

10.1016/0022-5088(73)90146-X

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：351 / 359

页数：9

共 8 条

[1] PROPERTIES OF BERYLLIUM SURFACES AND FILMS
ADAMS, RO
HURD, JT
[J]. JOURNAL OF THE LESS-COMMON METALS, 1969, 18 (04): : 399 - &
[2] THERMAL MICROSTRESSES IN BERYLLIUM AND OTHER HCP MATERIALS
ARMSTRONG, RW
BORCH, NR
[J]. METALLURGICAL TRANSACTIONS, 1971, 2 (11): : 3073 - +
[3] MARINGER RE, DMIC248 MEM
[4] PALATNIK LS, 1964, FIZ MET METALLOVED, V17, P866
[5] PALATNIK LS, 1964, FIZ MET METALLOVED, V18, P69
[6] PALATNIK LS, 1966, FIZ MET METALLOVED, V22, P936
[7] ROOM-TEMPERATURE RECRYSTALLIZATION IN THICK BIAS-SPUTTERED COPPER DEPOSITS
PATTEN, JW
MCCLANAHAN, ED
JOHNSTON, JW
[J]. JOURNAL OF APPLIED PHYSICS, 1971, 42 (11) : 4371 - +
[8] ORIENTATION OF VACUUM-DEPOSITED BE THIN FILMS
VERDERBER, RR
[J]. JOURNAL OF APPLIED PHYSICS, 1964, 35 (05) : 1643 - &