ANALYSIS OF EVAPORATED SILICON OXIDE FILMS BY MEANS OF (D,P) NUCLEAR REACTIONS AND INFRARED SPECTROPHOTOMETRY

被引：49

作者：

CACHARD, A

ROGER, JA

PIVOT, J

DUPUY, CHS

机构：

来源：

PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1971年 / 5卷 / 03期

关键词：

D O I：

10.1002/pssa.2210050314

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：637 / &

共 20 条

[1] DIELECTRIC PROPERTIES OF FILMS FORMED BY VACUUM EVAPORATION OF SILICON MONOXIDE
ANASTASIO, TA
[J]. JOURNAL OF APPLIED PHYSICS, 1967, 38 (06) : 2606 - +
[2] *ETUDE DES VIBRATIONS DU QUARTZ ACTIVES DANS LES SPECTRES DE DIFFUSION ET DABSORPTION INFRAROUGE
BARRIOL, J
[J]. JOURNAL DE PHYSIQUE ET LE RADIUM, 1946, 7 (07): : 209 - 216
[3] CACHARD A, 1970, CR ACAD SCI B PHYS, V270, P1058
[4] CACHARD A, TO BE PUBLISHED
[5] STRUCTURE OF SILICON OXIDE FILMS
COLEMAN, MV
THOMAS, DJD
[J]. PHYSICA STATUS SOLIDI, 1967, 22 (02): : 593 - &
[6] FAESSLER A, 1959, ANN PHYS, V7, P263
[7] GARSKI H, 1964, Z NATURFORSCH PT A, VA 19, P1219
[8] Kats A., 1962, PHILIPS RES REP, V17, P133
[9] INFRARED STUDIES ON POLYMORPHS OF SILICON DIOXIDE AND GERMANIUM DIOXIDE
LIPPINCOTT, ER
VANVALKENBURG, A
WEIR, CE
BUNTING, EN
[J]. JOURNAL OF RESEARCH OF THE NATIONAL BUREAU OF STANDARDS, 1958, 61 (01): : 61 - 70
[10] Pivot J., 1970, Physica Status Solidi A, V2, P319, DOI 10.1002/pssa.19700020219