EXTENDED FUNCTION OF A HIGH-T-C TRANSITION EDGE BOLOMETER ON A MICROMACHINED SI MEMBRANE

被引:11
作者
NEFF, H
LAUKEMPER, J
HEFLE, G
BURNUS, M
HEIDENBLUT, T
MICHALKE, W
STEINBEISS, E
机构
[1] UNIV HANNOVER,INST HALBLEITERTECHNOL & WERKSTOFFE ELEKTROTECH,D-20167 HANNOVER,GERMANY
[2] INST PHYS HOCHTECHNOL,D-07743 JENA,GERMANY
关键词
D O I
10.1063/1.114567
中图分类号
O59 [应用物理学];
学科分类号
摘要
The bolometric performance of a high-T-c transition edge bolometer has been evaluated within the temperature range 80 K<T<300 K. The detectivity D* of the device is peaking at transition midpoint and remains at moderate levels up to room temperature. The bolometric time constant of the device increases from 0.33 ms at transition midpoint to 1.55 ms at ambient temperature. The noise pattern displays 1/f behavior at low frequency and is scaling with bias current and the thermal resistance coefficient beta of the superconducting film. (C) 1995 American Institute of Physics.
引用
收藏
页码:1917 / 1919
页数:3
相关论文
共 12 条
[1]  
FOOTE MC, 1994, P SOC PHOTO-OPT INS, V2159, P2, DOI 10.1117/12.176130
[2]  
HIRAI A, 1990, CRYOGENICS, V30, P910
[3]  
Ho C. Y., 1975, THERMAL CONDUCTIVITY
[4]   SUPERCONDUCTING TRANSITION OF MULTICONNECTED JOSEPHSON NETWORK [J].
ISHIDA, T ;
MAZAKI, H .
JOURNAL OF APPLIED PHYSICS, 1981, 52 (11) :6798-6805
[5]   YBa2Cu3O7 SUPERCONDUCTOR MICROBOLOMETER ARRAYS FABRICATED BY SILICON MICROMACHINING [J].
Johnson, B. R. ;
Ohnstein, T. ;
Han, C. J. ;
Higashi, R. ;
Kruse, P. W. ;
Wood, R. A. ;
Marsh, H. ;
Dunham, S. B. .
IEEE TRANSACTIONS ON APPLIED SUPERCONDUCTIVITY, 1993, 3 (01) :2856-2859
[6]   INFLUENCE OF STRUCTURAL RELAXATION ON THE PARAMETERS OF A SUPERCONDUCTOR [J].
KOZUB, VI .
PHYSICAL REVIEW B, 1994, 49 (10) :6895-6902
[7]  
Leonov V. N., 1991, Superconductivity: Physics, Chemistry, Technology, V4, P1260
[8]   EPITAXIAL YBA2CU3O7-Y BOLOMETERS ON MICROMACHINED WINDOWS IN SILICON-WAFERS [J].
LI, Q ;
FENNER, DB ;
HAMBLEN, WD ;
HAMBLEN, DG .
APPLIED PHYSICS LETTERS, 1993, 62 (19) :2428-2430
[9]   SENSITIVE HIGH-T-C TRANSITION EDGE BOLOMETER ON A MICROMACHINED SILICON MEMBRANE [J].
NEFF, H ;
LAUKEMPER, J ;
KHREBTOV, IA ;
TKACHENKO, AD ;
STEINBEISS, E ;
MICHALKE, W ;
BURNUS, M ;
HEIDENBLUT, T ;
HEFLE, G ;
SCHWIERZI, B .
APPLIED PHYSICS LETTERS, 1995, 66 (18) :2421-2423
[10]   EXCESS NOISE, STRUCTURAL-PROPERTIES, AND THEIR EFFECTS ON BOLOMETRIC PERFORMANCE OF THIN SUPERCONDUCTING FILMS ON SILICON MEMBRANES [J].
NEFF, H ;
SCHAUBE, W ;
LAUKEMPER, J ;
BURNUS, M ;
HEIDENBLUT, T ;
HEFLE, G ;
SCHWIERZI, B ;
MICHALKE, W ;
STEINBEISS, E .
JOURNAL OF APPLIED PHYSICS, 1995, 77 (09) :4580-4583