STUDY OF PREFERENTIAL SPUTTERING ON BINARY ALLOY BY INSITU AUGER MEASUREMENT OF SPUTTERED AND SPUTTER-DEPOSITED SURFACES

被引：45

作者：

SHIMIZU, R ^{[1
]}

SAEKI, N ^{[1
]}

机构：

[1] OSAKA UNIV,FAC ENGN,DEPT APPL PHYS,SUITA,OSAKA 565,JAPAN

来源：

SURFACE SCIENCE | 1977年 / 62卷 / 02期

关键词：

D O I：

10.1016/0039-6028(77)90114-5

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

收藏

页码：751 / 755

页数：5

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