FACTORS CONTROLLING THE ETCHING RATE AND ETCHING PROFILE IN THE O-2 REACTIVE ION ETCHING PATTERN TRANSFER STEP IN MULTILEVEL LITHOGRAPHY

被引:6
作者
JURGENSEN, CW
SHAQFEH, ESG
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D O I
10.1002/pen.760291310
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TQ [化学工业];
学科分类号
0817 ;
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页码:878 / 881
页数:4
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