MICROBEAM SYSTEM FOR STUDY OF SINGLE EVENT UPSET OF SEMICONDUCTOR-DEVICES

被引:29
作者
KAMIYA, T [1 ]
UTSUNOMIYA, N [1 ]
MINEHARA, E [1 ]
TANAKA, R [1 ]
OHDOMARI, I [1 ]
机构
[1] WASEDA UNIV,SCH SCI & ENGN,TOKYO 169,JAPAN
关键词
D O I
10.1016/0168-583X(92)95495-D
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
A high energy heavy ion microbeam system has just been installed on a beam line of the 3 MV tandem electrostatic accelerator mainly for analysis of single event upset (SEU) of LSI memories in spacecraft. This system was designed for precise beam positioning at a desired microscopic area of the microcircuit, to experimentally evaluate of actual SEU sensitive area, and also to allow single ion hits for observing a transient charge pulse from an SEU. For these purposes, a fair amount of target beam current is required for beam positioning at the desired area. The system is equipped with two lens systems: one to control the target beam current in a wide range down to an extremely low current without any change of the beam optics, and the other to focus heavy ion beams within a spot size of 1-mu-m. The final goal is to hit a microscopic target area with a single 15 MeV nickel ion.
引用
收藏
页码:362 / 366
页数:5
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