MODELING OF RADIO-FREQUENCY PLASMAS IN TETRAFLUOROMETHANE (CF4) - THE GAS-PHASE PHYSICS AND THE ROLE OF NEGATIVE-ION DETACHMENT

被引：46

作者：

GOGOLIDES, E ^{[1
]}

STATHAKOPOULOS, M ^{[1
]}

BOUDOUVIS, A ^{[1
]}

机构：

[1] DEPT CHEM ENGN,GR-15773 ATHENS,GREECE

来源：

JOURNAL OF PHYSICS D-APPLIED PHYSICS | 1994年 / 27卷 / 09期

关键词：

D O I：

10.1088/0022-3727/27/9/011

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A fluid model is used to study a radio frequency (RF) CF4 discharge at various powers, pressures and electrode spacings and is found to compare successfully with experimental data. The discharge shows an electronegative behaviour with a high concentration of negative ions. The role of electron detaching radicals CFx is subsequently studied by varying their density. At high radical densities (1%), the discharge behaviour and operating point change drastically and attachment-induced ionization instabilities develop. The implications to plasma etching and experiments are discussed.

引用

页码：1878 / 1886

页数：9

共 54 条

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