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EFFECT OF GAMMA-RAY IRRADIATION ON SURFACE STATES OF MOS TUNNEL-JUNCTIONS
被引:21
作者
:
MA, TP
论文数:
0
引用数:
0
h-index:
0
机构:
YALE UNIV, NEW HAVEN, CT 06520 USA
YALE UNIV, NEW HAVEN, CT 06520 USA
MA, TP
[
1
]
BARKER, RC
论文数:
0
引用数:
0
h-index:
0
机构:
YALE UNIV, NEW HAVEN, CT 06520 USA
YALE UNIV, NEW HAVEN, CT 06520 USA
BARKER, RC
[
1
]
机构
:
[1]
YALE UNIV, NEW HAVEN, CT 06520 USA
来源
:
JOURNAL OF APPLIED PHYSICS
|
1974年
/ 45卷
/ 01期
关键词
:
D O I
:
10.1063/1.1662978
中图分类号
:
O59 [应用物理学];
学科分类号
:
摘要
:
引用
收藏
页码:317 / 321
页数:5
相关论文
共 23 条
[1]
SURFACE STATES AT STEAM-GROWN SILICON-SILICON DIOXIDE INTERFACES
[J].
BERGLUND, CN
论文数:
0
引用数:
0
h-index:
0
BERGLUND, CN
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1966,
ED13
(10)
:701
-+
[2]
CONDUCTANCE ASSOCIATED WITH INTERFACE STATES IN MOS TUNNEL STRUCTURES
[J].
CARD, HC
论文数:
0
引用数:
0
h-index:
0
CARD, HC
;
RHODERICK, EH
论文数:
0
引用数:
0
h-index:
0
RHODERICK, EH
.
SOLID-STATE ELECTRONICS,
1972,
15
(09)
:993
-+
[3]
THEORY OF TUNNELING INTO INTERFACE STATES
[J].
FREEMAN, LB
论文数:
0
引用数:
0
h-index:
0
FREEMAN, LB
;
DAHLKE, WE
论文数:
0
引用数:
0
h-index:
0
DAHLKE, WE
.
SOLID-STATE ELECTRONICS,
1970,
13
(11)
:1483
-+
[4]
SURFACE STATES IN SILICON FROM CHARGES IN OXIDE COATING
[J].
GOETZBERGER, A
论文数:
0
引用数:
0
h-index:
0
GOETZBERGER, A
;
HEINE, V
论文数:
0
引用数:
0
h-index:
0
HEINE, V
;
NICOLLIAN, EH
论文数:
0
引用数:
0
h-index:
0
NICOLLIAN, EH
.
APPLIED PHYSICS LETTERS,
1968,
12
(03)
:95
-+
[5]
MODEL FOR RADIATION-INDUCED CHARGE TRAPPING AND ANNEALING IN OXIDE LAYER OF MOS DEVICES
[J].
GWYN, CW
论文数:
0
引用数:
0
h-index:
0
机构:
Sandia Laboratories, Albuquerque
GWYN, CW
.
JOURNAL OF APPLIED PHYSICS,
1969,
40
(12)
:4886
-+
[6]
EFFECTS OF OXIDE TRAPS ON MOS CAPACITANCE
[J].
HEIMAN, FP
论文数:
0
引用数:
0
h-index:
0
HEIMAN, FP
;
WARFIELD, G
论文数:
0
引用数:
0
h-index:
0
WARFIELD, G
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1965,
ED12
(04)
:167
-&
[7]
NON-EQUILIBRIUM C-V AND I-V CHARACTERISTICS OF METAL-INSULATOR-SEMICONDUCTOR CAPACITORS
[J].
HIELSCHER, FH
论文数:
0
引用数:
0
h-index:
0
机构:
Research and Development Center, Sprague Electric Company, North Adams
HIELSCHER, FH
;
PREIER, HM
论文数:
0
引用数:
0
h-index:
0
机构:
Research and Development Center, Sprague Electric Company, North Adams
PREIER, HM
.
SOLID-STATE ELECTRONICS,
1969,
12
(07)
:527
-+
[8]
Hughes H. L., 1964, ELECTRONICS, V37, P58
[9]
DEPENDENCE OF MOS DEVICE RADIATION-SENSITIVITY ON OXIDE IMPURITIES
[J].
HUGHES, HL
论文数:
0
引用数:
0
h-index:
0
机构:
USN,RES LAB,WASHINGTON,DC 20390
HUGHES, HL
;
BAXTER, RD
论文数:
0
引用数:
0
h-index:
0
机构:
USN,RES LAB,WASHINGTON,DC 20390
BAXTER, RD
;
PHILLIPS, B
论文数:
0
引用数:
0
h-index:
0
机构:
USN,RES LAB,WASHINGTON,DC 20390
PHILLIPS, B
.
IEEE TRANSACTIONS ON NUCLEAR SCIENCE,
1972,
NS19
(06)
:256
-263
[10]
RADIATION-INDUCED PERTURBATIONS OF ELECTRICAL PROPERTIES OF SILICON-SILICON DIOXIDE INTERFACE
[J].
HUGHES, HL
论文数:
0
引用数:
0
h-index:
0
机构:
Naval Research Laboratory, Washington
HUGHES, HL
.
IEEE TRANSACTIONS ON NUCLEAR SCIENCE,
1969,
NS16
(06)
:195
-&
←
1
2
3
→
共 23 条
[1]
SURFACE STATES AT STEAM-GROWN SILICON-SILICON DIOXIDE INTERFACES
[J].
BERGLUND, CN
论文数:
0
引用数:
0
h-index:
0
BERGLUND, CN
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1966,
ED13
(10)
:701
-+
[2]
CONDUCTANCE ASSOCIATED WITH INTERFACE STATES IN MOS TUNNEL STRUCTURES
[J].
CARD, HC
论文数:
0
引用数:
0
h-index:
0
CARD, HC
;
RHODERICK, EH
论文数:
0
引用数:
0
h-index:
0
RHODERICK, EH
.
SOLID-STATE ELECTRONICS,
1972,
15
(09)
:993
-+
[3]
THEORY OF TUNNELING INTO INTERFACE STATES
[J].
FREEMAN, LB
论文数:
0
引用数:
0
h-index:
0
FREEMAN, LB
;
DAHLKE, WE
论文数:
0
引用数:
0
h-index:
0
DAHLKE, WE
.
SOLID-STATE ELECTRONICS,
1970,
13
(11)
:1483
-+
[4]
SURFACE STATES IN SILICON FROM CHARGES IN OXIDE COATING
[J].
GOETZBERGER, A
论文数:
0
引用数:
0
h-index:
0
GOETZBERGER, A
;
HEINE, V
论文数:
0
引用数:
0
h-index:
0
HEINE, V
;
NICOLLIAN, EH
论文数:
0
引用数:
0
h-index:
0
NICOLLIAN, EH
.
APPLIED PHYSICS LETTERS,
1968,
12
(03)
:95
-+
[5]
MODEL FOR RADIATION-INDUCED CHARGE TRAPPING AND ANNEALING IN OXIDE LAYER OF MOS DEVICES
[J].
GWYN, CW
论文数:
0
引用数:
0
h-index:
0
机构:
Sandia Laboratories, Albuquerque
GWYN, CW
.
JOURNAL OF APPLIED PHYSICS,
1969,
40
(12)
:4886
-+
[6]
EFFECTS OF OXIDE TRAPS ON MOS CAPACITANCE
[J].
HEIMAN, FP
论文数:
0
引用数:
0
h-index:
0
HEIMAN, FP
;
WARFIELD, G
论文数:
0
引用数:
0
h-index:
0
WARFIELD, G
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1965,
ED12
(04)
:167
-&
[7]
NON-EQUILIBRIUM C-V AND I-V CHARACTERISTICS OF METAL-INSULATOR-SEMICONDUCTOR CAPACITORS
[J].
HIELSCHER, FH
论文数:
0
引用数:
0
h-index:
0
机构:
Research and Development Center, Sprague Electric Company, North Adams
HIELSCHER, FH
;
PREIER, HM
论文数:
0
引用数:
0
h-index:
0
机构:
Research and Development Center, Sprague Electric Company, North Adams
PREIER, HM
.
SOLID-STATE ELECTRONICS,
1969,
12
(07)
:527
-+
[8]
Hughes H. L., 1964, ELECTRONICS, V37, P58
[9]
DEPENDENCE OF MOS DEVICE RADIATION-SENSITIVITY ON OXIDE IMPURITIES
[J].
HUGHES, HL
论文数:
0
引用数:
0
h-index:
0
机构:
USN,RES LAB,WASHINGTON,DC 20390
HUGHES, HL
;
BAXTER, RD
论文数:
0
引用数:
0
h-index:
0
机构:
USN,RES LAB,WASHINGTON,DC 20390
BAXTER, RD
;
PHILLIPS, B
论文数:
0
引用数:
0
h-index:
0
机构:
USN,RES LAB,WASHINGTON,DC 20390
PHILLIPS, B
.
IEEE TRANSACTIONS ON NUCLEAR SCIENCE,
1972,
NS19
(06)
:256
-263
[10]
RADIATION-INDUCED PERTURBATIONS OF ELECTRICAL PROPERTIES OF SILICON-SILICON DIOXIDE INTERFACE
[J].
HUGHES, HL
论文数:
0
引用数:
0
h-index:
0
机构:
Naval Research Laboratory, Washington
HUGHES, HL
.
IEEE TRANSACTIONS ON NUCLEAR SCIENCE,
1969,
NS16
(06)
:195
-&
←
1
2
3
→