DIFFUSION MECHANISM OF ZINC AND BERYLLIUM IN GALLIUM-ARSENIDE

被引:150
作者
YU, S [1 ]
TAN, TY [1 ]
GOSELE, U [1 ]
机构
[1] MICROELECTR CTR N CAROLINA, RES TRIANGLE PK, NC 27709 USA
关键词
D O I
10.1063/1.348497
中图分类号
O59 [应用物理学];
学科分类号
摘要
The outstanding features associated with Zn and Be diffusion in GaAs substrates and GaAs/AlGaAs superlattices are explained either quantitatively or semiquantitatively using the kick-out mechanism, in which it is assumed that the doubly positively charged Ga self-interstitial governs Ga self-diffusion. These features include (i) the dependence of the Zn solubility upon the pressures of the As and Zn vapor phases, (ii) the square power-law dependence of the Zn diffusivity on its own background concentrations under Zn isoconcentration diffusion conditions, (iii) the different shapes of the Zn in-diffusion profiles, (iv) the much lower diffusivities of Zn and Be under out-diffusion conditions than under in-diffusion conditions, and (v) the tremendous enhancement effect of Zn in-diffusion on GaAs/AlGaAs superlattice disordering and the undetectable effect of Be under out-diffusion conditions. Some useful quantitative information has been obtained. Strictly on a qualitative basis, we have found that the Longini mechanism is also able to explain the above features (i)-(iv) fairly well. The predicted effects of the Longini mechanism on Ga self-diffusion are, however, contrary to experimental results associated with superlattice disordering.
引用
收藏
页码:3547 / 3565
页数:19
相关论文
共 39 条
[1]   VAPOR PRESSURES AND PHASE EQUILIBRIA IN GA-AS SYSTEM [J].
ARTHUR, JR .
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1967, 28 (11) :2257-&
[2]  
Casey H.C., 1973, ATOMIC DIFFUSION SEM, P351
[3]  
CASEY HC, 1968, T METALL SOC AIME, V242, P406
[4]   DEPENDENCE OF DIFFUSION COEFFICIENT ON FERMI LEVEL - ZINC IN GALLIUM ARSENIDE [J].
CASEY, HC ;
PANISH, MB ;
CHANG, LL .
PHYSICAL REVIEW, 1967, 162 (03) :660-+
[5]   DIFFUSION MECHANISM OF ZN IN GAAS + GAP BASED ON ISOCONCENTRATION DIFFUSION EXPERIMENTS [J].
CHANG, LL ;
PEARSON, GL .
JOURNAL OF APPLIED PHYSICS, 1964, 35 (06) :1960-&
[6]   APPLICATION OF THE CHARGED POINT-DEFECT MODEL TO DIFFUSION AND INTERDIFFUSION IN GAAS [J].
COHEN, RM .
JOURNAL OF APPLIED PHYSICS, 1990, 67 (12) :7268-7273
[7]   DIFFUSION OF ZINC IN GALLIUM ARSENIDE [J].
CUNNELL, FA ;
GOOCH, CH .
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1960, 15 (1-2) :127-133
[8]   ANOMALOUS REDISTRIBUTION OF BERYLLIUM IN GAAS GROWN BY MOLECULAR-BEAM EPITAXY [J].
ENQUIST, P ;
WICKS, GW ;
EASTMAN, LF ;
HITZMAN, C .
JOURNAL OF APPLIED PHYSICS, 1985, 58 (11) :4130-4134
[9]   GROWTH AND DIFFUSION OF ABRUPT ZINC PROFILES IN GALLIUM-ARSENIDE AND HETEROJUNCTION BIPOLAR-TRANSISTOR STRUCTURES GROWN BY ORGANOMETALLIC VAPOR-PHASE EPITAXY [J].
ENQUIST, P ;
HUTCHBY, JA ;
DELYON, TJ .
JOURNAL OF APPLIED PHYSICS, 1988, 63 (09) :4485-4493
[10]   MECHANISM OF DIFFUSION OF COPPER IN GERMANIUM [J].
FRANK, FC ;
TURNBULL, D .
PHYSICAL REVIEW, 1956, 104 (03) :617-618