RECOIL IMPLANTATION FROM THIN SURFACE-FILMS ON SILICON

[1] [Anonymous], 1963, KGL DANSKE VIDENSKAB

[2] MECHANISM OF DIFFUSION OF COPPER IN GERMANIUM [J]. PHYSICAL REVIEW, 1956, 104 (03): : 617 - 618

[3] HART RR, 1947, J APPL PHYS, V46, P5

[4] REACTOR IRRADIATION ENHANCED HETERO-DIFFUSION IN SILICON [J]. PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 1972, 10 (01): : 59 - +

[5] MOLINE RA, 1975, P INT C ATOMIC COLLI, P159

[6] NISHI H, 1974, P INT C ION IMPL, P347

[7] TRANSMISSION SPUTTERING AND RECOIL IMPLANTATION FROM THIN METAL-FILMS UNDER ION-BOMBARDMENT [J]. NUCLEAR INSTRUMENTS & METHODS, 1972, 102 (01): : 109 - &

[8] ROSS R, 1975, ISOTOPENPRAXIS, V11, P185

[9] THEORY OF SPUTTERING .I. SPUTTERING YIELD OF AMORPHOUS AND POLYCRYSTALLINE TARGETS [J]. PHYSICAL REVIEW, 1969, 184 (02): : 383 - +

[10] WINTERBON KB, 1970, MAT FYS MEDD DAN VID, V37, P14

[1] [Anonymous], 1963, KGL DANSKE VIDENSKAB

[2] MECHANISM OF DIFFUSION OF COPPER IN GERMANIUM [J]. PHYSICAL REVIEW, 1956, 104 (03): : 617 - 618

[3] HART RR, 1947, J APPL PHYS, V46, P5

[4] REACTOR IRRADIATION ENHANCED HETERO-DIFFUSION IN SILICON [J]. PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 1972, 10 (01): : 59 - +

[5] MOLINE RA, 1975, P INT C ATOMIC COLLI, P159

[6] NISHI H, 1974, P INT C ION IMPL, P347

[7] TRANSMISSION SPUTTERING AND RECOIL IMPLANTATION FROM THIN METAL-FILMS UNDER ION-BOMBARDMENT [J]. NUCLEAR INSTRUMENTS & METHODS, 1972, 102 (01): : 109 - &

[8] ROSS R, 1975, ISOTOPENPRAXIS, V11, P185

[9] THEORY OF SPUTTERING .I. SPUTTERING YIELD OF AMORPHOUS AND POLYCRYSTALLINE TARGETS [J]. PHYSICAL REVIEW, 1969, 184 (02): : 383 - +

[10] WINTERBON KB, 1970, MAT FYS MEDD DAN VID, V37, P14