ON THE METAL CLUSTER FORMATION IN IONIZED CLUSTER BEAM DEPOSITION

被引：9

作者：

MEI, SN ^{[1
]}

YANG, SN ^{[1
]}

WONG, J ^{[1
]}

CHOI, CH ^{[1
]}

LU, TM ^{[1
]}

机构：

[1] RENSSELAER POLYTECH INST,DEPT PHYS,TROY,NY 12181

来源：

JOURNAL OF CRYSTAL GROWTH | 1988年 / 87卷 / 2-3期

关键词：

D O I：

10.1016/0022-0248(88)90188-1

中图分类号：

O7 [晶体学];

学科分类号：

0702 ; 070205 ; 0703 ; 080501 ;

摘要：

引用

页码：357 / 364

页数：8

共 18 条

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[6] ION CLUSTER BEAM DEPOSITION OF SILVER AND GERMANIUM ON SILICON [J].

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SCHOUTEN, WJ .

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[7]

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[8]

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[9] ION-SURFACE INTERACTIONS DURING THIN-FILM DEPOSITION [J].

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[10]

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