OPTICAL BEHAVIOR NEAR THE FUNDAMENTAL ABSORPTION-EDGE OF SPUTTER-DEPOSITED MICROCRYSTALLINE ALUMINUM NITRIDE

被引：33

作者：

AITA, CR ^{[1
]}

KUBIAK, CJG ^{[1
]}

SHIH, FYH ^{[1
]}

机构：

[1] UNIV WISCONSIN,SURFACE STUDIES LAB,MILWAUKEE,WI 53201

来源：

关键词：

D O I：

10.1063/1.343986

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：4360 / 4363

页数：4

共 12 条

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[7] AUGER-ELECTRON AND X-RAY PHOTOELECTRON-SPECTROSCOPY OF SPUTTER DEPOSITED ALUMINUM NITRIDE
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[8] Pankove J., 1971, OPTICAL PROCESSES SE
[9] GROWTH OF AL AND AL NITRIDE FILMS IN N2-NE AND N2-(NE+AR) DISCHARGES - CONSTRUCTION OF A TERNARY GAS-PHASE DIAGRAM
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[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1988, 6 (03): : 1712 - 1716
[10] AL, AL-N ALLOY, AND AIN-COATED STEEL CORROSION BEHAVIOR IN O2-FREE KCL SOLUTIONS
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