KINETIC LIMITS OF MONOLAYER GROWTH ON (001) GAAS BY ORGANOMETALLIC CHEMICAL-VAPOR DEPOSITION

被引：118

作者：

ASPNES, DE

COLAS, E

STUDNA, AA

BHAT, R

KOZA, MA

KERAMIDAS, VG

机构：

来源：

PHYSICAL REVIEW LETTERS | 1988年 / 61卷 / 24期

关键词：

D O I：

10.1103/PhysRevLett.61.2782

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

引用

页码：2782 / 2785

页数：4

共 19 条

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[5]

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[9]

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