ANALOG MEMORY EFFECTS IN METAL/A-SI-H/METAL MEMORY DEVICES

被引:9
作者
SNELL, AJ [1 ]
LECOMBER, PG [1 ]
HAJTO, J [1 ]
ROSE, MJ [1 ]
OWEN, AE [1 ]
OSBORNE, IS [1 ]
机构
[1] UNIV EDINBURGH,DEPT ELECT ENGN,EDINBURGH EH9 3JL,MIDLOTHIAN,SCOTLAND
关键词
D O I
10.1016/S0022-3093(05)80352-7
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
In this paper we present experimental data for Metal/a-Si:H/Metal structures which demonstrate that they can be programmed into a range of non-volatile resistance states between 1 k-OMEGA and 1 M-OMEGA with nanosecond pulses of less than 5 V magnitude. A number of results are presented which show the importance of the top metal in the device operation.
引用
收藏
页码:1257 / 1262
页数:6
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