DETERMINATION OF CARRIER AND IMPURITY PROFILES IN DOPED N-TYPE QUANTUM-WELL STRUCTURES

被引:3
作者
DICKEY, SA [1 ]
LU, ZH [1 ]
MAO, E [1 ]
OH, EG [1 ]
MAJERFELD, A [1 ]
机构
[1] UNIV COLORADO,DEPT ELECT & COMP ENGN,BOULDER,CO 80309
来源
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY | 1994年 / 28卷 / 1-3期
基金
美国国家科学基金会;
关键词
CAPACITANCE-VOLTAGE; MULTIPLE-QUANTUM-WELL; CARRIER CONCENTRATION; PHOTOLUMINESCENCE;
D O I
10.1016/0921-5107(94)90079-5
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Because of the inherent potential profile in multiple-quantum-well and superlattice structures, there is an effective redistribution of carriers between barriers and wells. In this work it is shown that through a combination of capacitance-voltage (C-V), deep-level transient spectroscopy, photoluminescence and Hall effect measurements a comprehensive evaluation of the carrier profiles and barrier purity in n-type material can be obtained. A detailed theoretical analysis of the C-V data is also presented which includes the effects of barrier depletion, the Debye tail and penetration of the electron wavefunction into the barrier layers.
引用
收藏
页码:341 / 345
页数:5
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