DIFFUSION IN SILICON .2. ENHANCED DIFFUSION OF PHOSPHORUS IN SILICON

被引：15

作者：

PARKER, TJ

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1967年 / 38卷 / 09期

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D O I：

10.1063/1.1710153

中图分类号：

O59 [应用物理学];

学科分类号：

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页码：3475 / &

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