CHEMICAL AND ISOCONCENTRATION DIFFUSION OF ZN IN ALSB

被引:14
作者
SHOWAN, SR
SHAW, D
机构
[1] Physics Department, University of Hull
来源
PHYSICA STATUS SOLIDI | 1969年 / 32卷 / 01期
关键词
D O I
10.1002/pssb.19690320112
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
The chemical diffusion of Zn in AlSb has been investigated as a function of temperature in the range 650 to 933 °C and as a function of Zn surface concentration. The diffusion coefficient is found to be concentration‐dependent and shows a behaviour similar to that observed in GaAs, GaP, and InP. Isoconcentration diffusion of Zn at 933 °C in AlSb is found to be strongly concentration‐dependent. Quenching of Zn‐diffused samples shows that the substitutional Zn is a single‐level acceptor which is completely ionized at the diffusion temperature. It is concluded that the Longini model provides a satisfactory interpretation of the diffusion processes. Substitutional Zn in AlSb is also found to show retrograde solubility. Copyright © 1969 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim
引用
收藏
页码:97 / +
页数:1
相关论文
共 26 条
[1]   ELECTRICAL MEASUREMENTS + X-RAY LATTICE PARAMETER MEASUREMENTS OF GAAS DOPED WITH SE TE ZN + CD + STRESS EFFECTS OF THESE ELEMENTS AS DIFFUSANTS IN GAAS [J].
BLACK, J ;
LUBLIN, P .
JOURNAL OF APPLIED PHYSICS, 1964, 35 (08) :2462-&
[2]  
BLAKEMORE JS, 1962, SEMICONDUCTOR STATIS
[3]  
BOLTAKS BI, 1964, SOVIET PHYSSOLID STA, V6, P1181
[4]  
CASEY HC, 1967, PHYS REV, V162, P162
[5]   DIFFUSION + SOLUBILITY OF ZINC IN GALLIUM PHOSPHIDE SINGLE CRYSTALS [J].
CHANG, LL ;
PEARSON, GL .
JOURNAL OF APPLIED PHYSICS, 1964, 35 (02) :374-&
[6]   DIFFUSION MECHANISM OF ZN IN GAAS + GAP BASED ON ISOCONCENTRATION DIFFUSION EXPERIMENTS [J].
CHANG, LL ;
PEARSON, GL .
JOURNAL OF APPLIED PHYSICS, 1964, 35 (06) :1960-&
[7]   DIFFUSION AND SOLUBILITY OF ZINC IN INDIUM PHOSPHIDE [J].
CHANG, LL ;
CASEY, HC .
SOLID-STATE ELECTRONICS, 1964, 7 (06) :481-&
[8]   DIFFUSION OF ZINC IN GALLIUM ARSENIDE [J].
CUNNELL, FA ;
GOOCH, CH .
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1960, 15 (1-2) :127-133
[9]   HALL EFFECT AND RESISTIVITY OF ZN-DOPED GAAS [J].
ERMANIS, F ;
WOLFSTIR.K .
JOURNAL OF APPLIED PHYSICS, 1966, 37 (05) :1963-&
[10]   DIFFUSION IN COMPOUND SEMICONDUCTORS [J].
GOLDSTEIN, B .
PHYSICAL REVIEW, 1961, 121 (05) :1305-&