POLY(ALKENYLSILANE SULFONE)S AS POSITIVE ELECTRON-BEAM RESISTS FOR 2-LAYER SYSTEMS

被引：7

作者：

GOZDZ, AS

CRAIGHEAD, HG

BOWDEN, MJ

机构：

来源：

POLYMER ENGINEERING AND SCIENCE | 1986年 / 26卷 / 16期

关键词：

D O I：

10.1002/pen.760261609

中图分类号：

TQ [化学工业];

学科分类号：

0817 ;

摘要：

引用

页码：1123 / 1128

页数：6

共 16 条

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[6]

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[7] ALKENYLSILANE SULFONE COPOLYMERS AND TERPOLYMERS AS ELECTRON-BEAM-SENSITIVE POSITIVE RESISTS FOR 2-LAYER SYSTEMS [J].

GOZDZ, AS ;

CRAIGHEAD, HG ;

BOWDEN, MJ .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1985, 132 (11) :2809-2810

[8]

HATZAKIS M, 1979, J VAC SCI TECHNOL, V26, P2984

[9]

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[10]

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