THE KINETICS AND ENERGETICS OF SPUTTERING INDUCED TOPOGRAPHY ON SOLIDS

被引：12

作者：

CARTER, G ^{[1
]}

NOBES, MJ ^{[1
]}

LEWIS, GW ^{[1
]}

WHITTON, JL ^{[1
]}

机构：

[1] HC ORSTED INST,PHYS LAB 2,DK-2100 COPENHAGEN O,DENMARK

来源：

RADIATION EFFECTS LETTERS | 1980年 / 50卷 / 3-6期

关键词：

1980_021922_454_2.xlsx;

D O I：

10.1080/01422448008218661

中图分类号：

TL [原子能技术]; O571 [原子核物理学];

学科分类号：

0827 ; 082701 ;

摘要：

Sputtering

引用

收藏

页码：97 / 102

页数：6

相关论文

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[5] EQUILIBRIUM TOPOGRAPHY OF SPUTTERED AMORPHOUS SOLIDS .2.
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[6] INFLUENCE OF SURFACE-DIFFUSION ON TOPOGRAPHY DEVELOPMENT OF AN AMORPHOUS SOLID DURING SPUTTERING
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[J]. JOURNAL OF MATERIALS SCIENCE, 1976, 11 (06) : 1091 - 1098
[7] GROWTH OF TOPOGRAPHY DURING SPUTTERING OF AMORPHOUS SOLIDS .4. GENERALIZED THEORY
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[J]. JOURNAL OF MATERIALS SCIENCE, 1973, 8 (10) : 1473 - 1481
[8] CARTER G, 1976, P 8 INT SUMM SCH PHY, P239
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