1.0-1.6 MU-M PLANAR AVALANCHE PHOTO-DIODE BY LPE GROWN INP/INGAAS/INP DH STRUCTURE

被引:15
作者
SHIRAI, T
YAMAZAKI, S
YASUDA, K
MIKAWA, T
NAKAJIMA, K
KANEDA, T
机构
关键词
D O I
10.1049/el:19820389
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
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页码:575 / 577
页数:3
相关论文
共 4 条
[1]   TUNNELING CURRENT IN INGAAS AND OPTIMUM DESIGN FOR INGAAS-INP AVALANCHE PHOTO-DIODE [J].
ANDO, H ;
KANBE, H ;
ITO, M ;
KANEDA, T .
JAPANESE JOURNAL OF APPLIED PHYSICS, 1980, 19 (06) :L277-L280
[2]   FABRICATION OF COMPLETELY OH-FREE VAD FIBER [J].
HANAWA, F ;
SUDO, S ;
KAWACHI, M ;
NAKAHARA, M .
ELECTRONICS LETTERS, 1980, 16 (18) :699-700
[3]  
NAKAJIMA K, 1982, JPN J APPL PHYS, V21, P56
[4]   1.3 MU-M INP-INGAASP PLANAR AVALANCHE PHOTO-DIODES [J].
SHIRAI, T ;
OSAKA, F ;
YAMASAKI, S ;
NAKAJIMA, K ;
KANEDA, T .
ELECTRONICS LETTERS, 1981, 17 (22) :826-827