INSTALLATION AND EARLY OPERATING EXPERIENCE WITH THE HELIOS COMPACT SYNCHROTRON X-RAY SOURCE

被引：13

作者：

ARCHIE, CN

GRANLUND, JI

HILL, RW

KUKKONEN, KW

LEAVEY, JA

LESOINE, LG

OBERSCHMIDT, JM

PALUMBO, AE

WASIK, C

BARTON, MQ

SILVERMAN, JP

WARLAUMONT, JM

WILSON, AD

ANDERSON, RJ

CROSLAND, NC

JORDEN, AR

KEMPSON, VC

SCHOUTEN, J

SMITH, AIC

TOWNSEND, MC

UYTHOVEN, J

WILSON, MC

WILSON, MN

ANDREWS, DE

PALMER, R

WEBBER, R

WEGER, AJ

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,DIV RES,YORKTOWN HTS,NY 10598

[2] OXFORD INSTRUMENTS LTD,DIV SYNCHROTRON,OXFORD OX2 0DX,ENGLAND

[3] OXFORD SUPERCOND TECHNOL,CARTERET,NJ 07008

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1992年 / 10卷 / 06期

关键词：

D O I：

10.1116/1.585918

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

During 1991 the Oxford Instruments' compact synchrotron x-ray source Helios was installed at IBM's Advanced Lithography Facility, following factory tests in Oxford during 1990. The machine has met or exceeded all performance specifications at the East Fishkill site. Since January, 1992 it has been run routinely for lithography development work. Running and reliability statistics are being generated, and the results for the first five months are presented here.

引用

页码：3224 / 3228

页数：5

共 6 条

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