FABRICATION OF FULLY SCALED 0.5-MU-M N-TYPE METAL-OXIDE SEMICONDUCTOR TEST DEVICES USING SYNCHROTRON X-RAY-LITHOGRAPHY - OVERLAY, RESIST PROCESSES, AND DEVICE FABRICATION

被引：32

作者：

SILVERMAN, JP ^{[1
]}

DIMILIA, V ^{[1
]}

KATCOFF, D ^{[1
]}

KWIETNIAK, K ^{[1
]}

SEEGER, D ^{[1
]}

WANG, LK ^{[1
]}

WARLAUMONT, JM ^{[1
]}

WILSON, AD ^{[1
]}

CROCKATT, D ^{[1
]}

DEVENUTO, R ^{[1
]}

HILL, B ^{[1
]}

HSIA, LC ^{[1
]}

RIPPSTEIN, R ^{[1
]}

机构：

[1] IBM CORP,DIV GEN TECHNOL,HOPEWELL JUNCTION,NY 12533

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1988年 / 6卷 / 06期

关键词：

D O I：

10.1116/1.584104

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：2147 / 2152

页数：6

共 10 条

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[4] X-RAY-LITHOGRAPHY
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[5] THE UNIVERSITY-OF-WISCONSIN X-RAY-LITHOGRAPHY BEAMLINE - 1ST RESULTS
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[J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT, 1986, 246 (1-3) : 681 - 686
[6] DEVELOPMENT OF HIGHLY RELIABLE SYNCHROTRON RADIATION LITHOGRAPHY BEAMLINE
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[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (01): : 191 - 194
[7] SILVERMAN JP, 1983, P SOC PHOTO-OPT INST, V393, P99, DOI 10.1117/12.935100
[8] SILVERMAN JP, 1984, P SOC PHOTO-OPT INST, V448, P50, DOI 10.1117/12.939206
[9] FULLY SCALED 0.5 MU-M METAL-OXIDE SEMICONDUCTOR CIRCUITS BY SYNCHROTRON X-RAY-LITHOGRAPHY - MASK FABRICATION AND CHARACTERIZATION
VISWANATHAN, R
ACOSTA, RE
SEEGER, D
VOELKER, H
WILSON, A
BABICH, I
MALDONADO, J
WARLAUMONT, J
VLADIMIRSKY, O
HOHN, F
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FAIR, R
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (06): : 2196 - 2201
[10] WILSON AD, 1985, P SOC PHOTO-OPT INST, V537, P85, DOI 10.1117/12.947489

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