DYNAMICS OF THE DISSOCIATIVE ADSORPTION OF DISILANE ON SI(100) - ENERGY SCALING AND THE EFFECT OF CORRUGATION

The reaction of Si2H6 with the Si(100) surface has been examined via supersonic molecular beam scattering techniques. It is found that the reaction probability is most sensitive to the incident translational energy, varying nearly linearly with increasing energy for [E(tr)] > 1 eV. The effect of incident angle theta(i) is described by a model that accounts explicitly for surface corrugation and assumes that the reaction probability varies with [E(tr)] cos2 theta(loc), where theta(loc) is the incident angle with respect to the local surface normal.