1ST RESULTS OF MICROSPECTROSCOPY FROM A SCANNING PHOTOEMISSION MICROSCOPE WITH A SUBMICRON PROBE SIZE

被引：23

作者：

RAYCHAUDHURI, AK

NG, W

LIANG, S

SINGH, S

WELNAK, JT

WALLACE, JP

CAPASSO, C

CERRINA, F

MARGARITONDO, G

UNDERWOOD, JH

KORTRIGHT, JB

PERERA, RCC

机构：

[1] ECOLE POLYTECH FED LAUSANNE,INST PHYS APPL,CH-1015 LAUSANNE,SWITZERLAND

[2] LAWRENCE BERKELEY LAB,CTR XRAY OPT,BERKELEY,CA 94720

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1993年 / 11卷 / 04期

关键词：

D O I：

10.1116/1.578370

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Utilizing a Mo-Si multilayer coated Schwarzschild objective to focus 95 eV photons, we have recently demonstrated better than 0.1 mum resolution as a scanning x-ray transmission microscope. Operating as a scanning photoemission microscope with submicron resolution, we have demonstrated its chemical mapping capabilities by studying a patterned Al/AlO(x) test structure. In addition, we have also studied the cleaved GaAs (110) surface and have identified lateral variations in the surface band bending on the scale of 100 meV. In both experiments, core level microspectroscopy was performed at selected points on the sample to elucidate the image contrast mechanisms.

引用

页码：2324 / 2329

页数：6

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