ATOM PROBE ANALYSIS OF RF-SPUTTERED A-SI-H FILMS

被引：10

作者：

KRISHNASWAMY, SV

MESSIER, R

WU, CS

MCLANE, SB

TSONG, TT

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1981年 / 18卷 / 02期

关键词：

D O I：

10.1116/1.570748

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：309 / 312

页数：4

共 30 条

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[7] INFRARED VIBRATIONAL-SPECTRA OF RF-SPUTTERED HYDROGENATED AMORPHOUS SILICON [J].

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[8]

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[10] MICROSTRUCTURE OF PLASMA-DEPOSITED A-SI-H FILMS [J].

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