KRF(B) QUENCHING BY HE, NE, XE, AND NF3

被引：15

作者：

EDEN, JG

WAYNANT, RW

SEARLES, SK

BURNHAM, R

机构：

[1] Laser Physics Branch, Naval Research Laboratory, Washington

来源：

JOURNAL OF APPLIED PHYSICS | 1978年 / 49卷 / 11期

关键词：

D O I：

10.1063/1.324505

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Flash photolysis of KrF2 at 193 nm has been utilized to directly measure the quenching rate constants of KrF(B) molecules by He, Ne, Xe, and NF3. Investigation of the large rate constant measured for the KrF(B)+Xe reaction (≳10-9 cm3 sec-1) verified the XeF(B) state to be a product.

引用

页码：5368 / 5372

页数：5

共 22 条

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