THEORY OF HOPPING TRANSPORT OF HOLES IN AMORPHOUS SIO2

被引:2
作者
DEB, BM
CHANDORKAR, AN
机构
[1] Department of Electrical Engineering, Indian Institute of Technology
关键词
D O I
10.1063/1.359276
中图分类号
O59 [应用物理学];
学科分类号
摘要
A quantum-mechanical theory of hole transport in SiO2 is developed based on modeling of the oxide as an array of time-dependent δ-function potential well distribution. Holes undergo a variable range hopping transport which is dispersive in nature. The oxide, being an insulator, involves a maximum cutoff phonon frequency of 1014-1015 s-1. The Schrödinger equation is solved along with the Poisson equation using a piecewise linear internal field. The theory is applied to metal-oxide-semiconductor structures subjected to a short radiation pulse. © 1995 American Institute of Physics.
引用
收藏
页码:5248 / 5255
页数:8
相关论文
共 13 条
[1]  
Abramowitz M., 1970, HDB MATH FUNCTIONS F
[2]   1/F NOISE IN AMORPHOUS-SILICON AND HYDROGENATED AMORPHOUS-SILICON THIN-FILMS [J].
BACIOCCHI, M ;
DAMICO, A ;
VANVLIET, CM .
SOLID-STATE ELECTRONICS, 1991, 34 (12) :1439-1447
[3]   HOLE TRANSPORT AND TRAPPING IN FIELD OXIDES [J].
BOESCH, HE ;
MCLEAN, FB .
IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 1985, 32 (06) :3940-3945
[4]  
DEB BM, 1993, 7TH P INT WORKSH PHY, P346
[5]   TIME-RESOLVED HOLE TRANSPORT IN ALPHA-SIO2 [J].
HUGHES, RC .
PHYSICAL REVIEW B, 1977, 15 (04) :2012-2020
[6]   EXACT SOLUTION OF THE SCHRODINGER-EQUATION ACROSS AN ARBITRARY ONE-DIMENSIONAL PIECEWISE-LINEAR POTENTIAL BARRIER [J].
LUI, WW ;
FUKUMA, M .
JOURNAL OF APPLIED PHYSICS, 1986, 60 (05) :1555-1559
[7]  
MCLEAN FB, 1990, IONIZING RAD EFFECTS, P87
[8]  
MCLEAN FB, 1987, HDLTR2117 H DIAM LAB
[9]  
MOTT MF, 1971, ELECTRONIC PROCESSES
[10]  
Nagels P., 1979, Amorphous semiconductors, P113