NUCLEATION OF SMALL METAL PARTICLES ON ULTRATHIN SIO2-FILMS ON SI

被引：5

作者：

KASPRZAK, L

LAIBOWITZ, R

HERD, S

OHRING, M

机构：

[1] IBM CORP, E FISHKILL FACIL, Hopewell Jct, NY 12533 USA

[2] IBM CORP, TJ WATSON RES CTR, YORKTOWN HTS, NY 10598 USA

[3] STEVENS INST TECHNOL, HOBOKEN, NJ 07030 USA

来源：

THIN SOLID FILMS | 1974年 / 22卷 / 02期

关键词：

D O I：

10.1016/0040-6090(74)90005-4

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：189 / 196

页数：8

共 21 条

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[8] INFLUENCE OF CHARGE EFFECTS ON GROWTH AND ELECTRICAL RESISTIVITY OF THIN METAL FILMS [J].

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