DETERMINATION OF SURFACE COMPOSITION PROFILES IN GLASS BY AUGER-ELECTRON SPECTROSCOPY AND ION ETCHING

被引：17

作者：

CHAPPELL, RA

STODDART, CTH

机构：

[1] PILKINGTON BROS LTD,RES & DEV LABS,ORMSKIRK,LANCASHIRE,ENGLAND

[2] NATL PHYS LAB,DIV CHEM STAND,TEDDINGTON TW11 0LW,MIDDLESEX,ENGLAND

来源：

关键词：

D O I：

10.1007/BF00561972

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：2001 / 2010

页数：10

共 11 条

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[2] CHAPPELL RA, UNPUBLISHED WORK
[3] CHAPPELL RA, 1977, 7TH P INT VAC C 3RD
[4] HAMMOND VJ, 1971, ELECTRON EQUIP NEWS, V13, P48
[5] SPUTTERING STUDIES OF INSULATORS BY MEANS OF LANGMUIR PROBES
JORGENSO.GV
WEHNER, GK
[J]. JOURNAL OF APPLIED PHYSICS, 1965, 36 (09) : 2672 - &
[6] Norgate P., 1974, Physics in Technology, V5, P186, DOI 10.1088/0305-4624/5/3/I02
[7] GLASS SURFACE ANALYSIS BY AUGER-ELECTRON SPECTROSCOPY
PANTANO, CG
DOVE, DB
ONODA, GY
[J]. JOURNAL OF NON-CRYSTALLINE SOLIDS, 1975, 19 (DEC) : 41 - 53
[8] AES COMPOSITIONAL PROFILES OF MOBILE IONS IN SURFACE REGION OF GLASS
PANTANO, CG
DOVE, DB
ONODA, GY
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1976, 13 (01): : 414 - 418
[9] ELEMENT PROFILES ACROSS THIN OXIDE-FILMS
STODDART, CT
HONDROS, ED
[J]. NATURE-PHYSICAL SCIENCE, 1972, 237 (75): : 90 - &
[10] STODDART CTH, TO BE PUBLISHED