LONG-RANGE MIGRATION OF NIOBIUM DURING ANODIC-OXIDATION OF TANTALUM ON NIOBIUM AND ALUMINUM ON NIOBIUM DUPLEX LAYERS

被引：22

作者：

RIGO, S ^{[1
]}

SIEJKA, J ^{[1
]}

机构：

[1] UNIV PARIS 7,ECOLE NORM SUPER,GRP PHYS SOLIDES,TOUR 23,2 PL JUSSIEU,75005 PARIS,FRANCE

来源：

SOLID STATE COMMUNICATIONS | 1974年 / 15卷 / 02期

关键词：

D O I：

10.1016/0038-1098(74)90753-4

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

引用

页码：259 / 264

页数：6

共 10 条

[1] 7ICROANALYSIS BY DIRECT OBSERVATION OF NUCLEAR REACTIONS USING A 2 MEV VAN-DE-GRAAFF
AMSEL, G
NADAI, JP
DARTEMAR.E
DAVID, D
GIRARD, E
MOULIN, J
[J]. NUCLEAR INSTRUMENTS & METHODS, 1971, 92 (04): : 481 - &
[2] MECHANISM OF ANODIC OXIDATION
AMSEL, G
SAMUEL, D
[J]. JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1962, 23 (DEC) : 1707 - &
[3] USE OF RUTHERFORD BACKSCATTERING TO STUDY BEHAVIOR OF ION-IMPLANTED ATOMS DURING ANODIC-OXIDATION OF ALUMINUM - AR, KR, XE, K, RB, CS, CL, BR, AND I
BROWN, F
MACKINTOSH, WD
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1973, 120 (08) : 1096 - 1102
[4] PRINCIPLES AND APPLICATIONS OF ION-BEAM TECHNIQUES FOR ANALYSIS OF SOLIDS AND THIN-FILMS
CHU, WK
MAYER, JW
NICOLET, MA
BUCK, TM
AMSEL, G
EISEN, F
[J]. THIN SOLID FILMS, 1973, 17 (01) : 1 - 41
[5] MIGRATION OF METAL AND OXYGEN DURING ANODIC FILM FORMATION
DAVIES, JA
DOMEIJ, B
PRINGLE, JPS
BROWN, F
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1965, 112 (07) : 675 - &
[6] MIGRATION OF OXYGEN DURING ANODIC-OXIDATION OF TANTALUM
PRINGLE, JPS
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1973, 120 (10) : 1391 - 1400
[7] TRANSIENT-RESPONSE OF SYSTEM TA/TA2O5/ELECTROLYTE .1. ION CURRENT TRANSIENTS
TAYLOR, DF
DIGNAM, MJ
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1973, 120 (10) : 1299 - 1305
[8] Verkerk B., 1958, PHILIPS RES REP, V13, P506
[9] ANODIC OXIDE FILMS ON NIOBIUM - THICKNESS, DIELECTRIC CONSTANT, DISPERSION, REFLECTION MINIMA, FORMATION FIELD STRENGTH, AND SURFACE AREA
YOUNG, L
[J]. CANADIAN JOURNAL OF CHEMISTRY, 1960, 38 (07) : 1141 - 1147
[10] Young L., 1961, ANODIC OXIDE FILMS

← 1 →