MOLECULAR-BEAM EPITAXY ON EXACT AND VICINAL GAAS(1)OVER-BAR-(1)OVER-BAR-(1)OVER-BAR

被引:42
作者
YANG, K
SCHOWALTER, LJ
LAURICH, BK
CAMPELL, IH
SMITH, DL
机构
[1] LOS ALAMOS NATL LAB,LOS ALAMOS,NM 87545
[2] RENSSELAER POLYTECH INST,DEPT PHYS,TROY,NY 12180
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1993年 / 11卷 / 03期
关键词
D O I
10.1116/1.586787
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
GaAs films grown on exact (111BAR) substrates in the square-root 19 X square-root 19 reconstruction regime always show facets. The facets are composed of vicinal surfaces which are inclined by small angles (approximately 2-degrees) from the exact (111BAR) plane. The comparison between surface morphologies of films grown on vicinal substrates tilted toward different directions shows that the most stable steps run along the [110] directions and step downward toward the [112BAR], [211BAR], and [121BAR] directions. In the square-root-19 X square-root 19-surface-reconstruction growth regime, smooth films can be grown only on substrates tilted toward the [211BAR] direction. This result suggests that a vicinal surface, which is tilted toward the [211BAR] direction, may have less surface-free energy than the exact (111BAR) surface. Characterization of superlattices grown on vicinal GaAs(111BAR) substrates, tilted 3-degrees toward the [211BAR] direction, are also presented.
引用
收藏
页码:779 / 782
页数:4
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