THEORETICAL TREATMENT OF CASCADE MIXING IN DEPTH PROFILING BY SPUTTERING

被引：81

作者：

HOFER, WO ^{[1
]}

LITTMARK, U ^{[1
]}

机构：

[1] UNIV COPENHAGEN,HC ORSTED INST,DK-2100 COPENHAGEN O,DENMARK

来源：

PHYSICS LETTERS A | 1979年 / 71卷 / 5-6期

关键词：

D O I：

10.1016/0375-9601(79)90635-2

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

An analytic expression for mixing in recoil cascades is discussed with particular emphasis on in-depth concentration profiling. Examples presented show that an asymmetric distortion is not necessarily a consequence of direct recoil implantation or an anisotropic velocity distribution. © 1979.

引用

页码：457 / 460

页数：4

共 12 条

[1] DEPTH RESOLUTION OF SPUTTER PROFILING
ANDERSEN, HH
[J]. APPLIED PHYSICS, 1979, 18 (02): : 131 - 140
[2] HEINEN H, 1964, Z ANGEW PHYS, V17, P356
[3] ELECTRONIC APERTURE FOR IN-DEPTH ANALYSIS OF SOLIDS WITH AN ION MICROPROBE
HOFER, WO
LIEBL, H
ROOS, G
STAUDENMAIER, G
[J]. INTERNATIONAL JOURNAL OF MASS SPECTROMETRY AND ION PROCESSES, 1976, 19 (03): : 327 - 334
[4] DEPTH-PROFILING OF CU-NI SANDWICH SAMPLES BY SECONDARY ION MASS-SPECTROMETRY
HOFER, WO
LIEBL, H
[J]. APPLIED PHYSICS, 1975, 8 (04): : 359 - 360
[5] HOFKER WK, 1975, RAD EFF, V25, P206
[6] ISHITANI T, 1975, APPL PHYS, V6, P241, DOI 10.1007/BF00883758
[7] MOMENTUM DEPOSITION BY HEAVY-ION BOMBARDMENT AND AN APPLICATION TO SPUTTERING
LITTMARK, U
SIGMUND, P
[J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1975, 8 (03) : 241 - 245
[8] SUPER RANGES OF FAST IONS IN COPPER SINGLE CRYSTALS
LUTZ, H
SIZMANN, R
[J]. PHYSICS LETTERS, 1963, 5 (02): : 113 - 114
[9] Schulz F., 1973, Radiation Effects, V18, P211, DOI 10.1080/00337577308232124
[10] THEORY OF SPUTTERING .I. SPUTTERING YIELD OF AMORPHOUS AND POLYCRYSTALLINE TARGETS
SIGMUND, P
[J]. PHYSICAL REVIEW, 1969, 184 (02): : 383 - +

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