SELF-ALIGNED COBALT DISILICIDE FOR GATE AND INTERCONNECTION AND CONTACTS TO SHALLOW JUNCTIONS

被引：48

作者：

MURARKA, SP

FRASER, DB

SINHA, AK

LEVINSTEIN, HJ

LLOYD, EJ

LIU, R

WILLIAMS, DS

HILLENIUS, SJ

机构：

[1] INTEL CORP,LIVERMORE,CA 94550

[2] AT&T BELL LABS,ALLENTOWN,PA 18103

[3] AT&T BELL LABS,MURRAY HILL,NJ 07974

来源：

关键词：

D O I：

10.1109/T-ED.1987.23204

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：2108 / 2115

页数：8

共 28 条

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