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RELATIONSHIP OF THE CURRENT-VOLTAGE CHARACTERISTICS TO THE DISTRIBUTION OF FILAMENT RESISTANCES IN ELECTROFORMED MIM STRUCTURES

被引：22
作者：
GOULD, RD
机构：
[1] School of Physics, University of Science, Minden, Penang
来源：
THIN SOLID FILMS | 1979年 / 57卷 / 01期
关键词：
D O I：
10.1016/0040-6090(79)90395-X
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The filamentary model of conduction in electroformed metal-insulator-metal structures was investigated by considering the dependence of the current-voltage characteristics on the distribution of filament resistances within the insulator. Not only the simple triangular filamentary distribution but also more complex distributions are considered, and the various effects of these are discussed. It is concluded that the filamentary model is sufficient to explain most of the experimental results to date. © 1979.
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页码：33 / 38
页数：6
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