IMPROVEMENT OF THE GROWTH OF INXGA1-XAS ON GAAS (001) USING TE AS SURFACTANT

被引:24
作者
GRANDJEAN, N [1 ]
MASSIES, J [1 ]
DELAMARRE, C [1 ]
WANG, LP [1 ]
DUBON, A [1 ]
LAVAL, JY [1 ]
机构
[1] CNRS,ESPCI,PHYS SOLID LAB,F-75231 PARIS 05,FRANCE
关键词
D O I
10.1063/1.110770
中图分类号
O59 [应用物理学];
学科分类号
摘要
It is demonstrated by using reflection high-energy electron diffraction and transmission electron microscopy that the epitaxial growth of highly strained InxGa1-xAs (x>0.3) layers on GaAs(001) is improved by a preadsorbed Te surfactant layer. The formation of 3D islands is inhibited by the surfactant action and consequently the onset of plastic relaxation (i.e., the critical thickness) is significantly delayed.
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页码:66 / 68
页数:3
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