MEASUREMENTS OF SECONDARY-ELECTRON EMISSION IN REACTIVE SPUTTERING OF ALUMINUM AND TITANIUM NITRIDE

被引：59

作者：

LEWIS, MA ^{[1
]}

GLOCKER, DA ^{[1
]}

JORNE, J ^{[1
]}

机构：

[1] UNIV ROCHESTER, DEPT CHEM ENGN, ROCHESTER, NY 14620 USA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 1989年 / 7卷 / 03期

关键词：

D O I：

10.1116/1.576222

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：1019 / 1024

页数：6

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