OPTICAL 3RD-HARMONIC GENERATION AT INTERFACES

被引:218
作者
TSANG, TYF
机构
[1] Brookhaven National Laboratory, Upton
来源
PHYSICAL REVIEW A | 1995年 / 52卷 / 05期
关键词
D O I
10.1103/PhysRevA.52.4116
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
Optical third-harmonic generation (THG) is generally a weak process but is dipole allowed, therefore it occurs in all materials, including dielectric materials with inversion symmetry. We report that when using focused high-intensity ultrashort laser pulses, this normally weak THG process becomes highly operative at a simple air-dielectric interface and is much stronger than the bulk of most dielectric materials. We characterized this nonlinear optical response at interfaces as a phenomenological surface-enhanced THG in transmission and/or in reflection. This surface THG is further cascaded in transmission or reflection from layered composite dielectric materials of a high-low index of refraction, resulting in a marked increase in photon conversion efficiency than that of a single interface. Although the present THG efficiency is lower than that of a typical phase-matching harmonic crystal, it is important to note that the surface-enhanced optical THG is a fundamental physical process occurring at all interfaces and is relatively free from the constraint of a phase-matching condition and wavelength restriction. Using optical THG at an interface, it becomes possible to generate wavelengths at which harmonic crystals are unavailable. These findings may lead to a new development of surface-enhanced studies and prompt a reexamination of the processes of high-harmonic generation at interfaces using a focused beam.
引用
收藏
页码:4116 / 4125
页数:10
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