DEVELOPMENTS OF A SURFACE-ANALYSIS APPARATUS AND TECHNIQUES USING MICRO-PROBE ELECTRON-BEAMS

被引：18

作者：

KONO, S ^{[1
]}

NAKAMURA, N ^{[1
]}

ANNO, K ^{[1
]}

TERUYAMA, S ^{[1
]}

机构：

[1] TOHOKU UNIV,FAC SCI,DEPT PHYS,SENDAI,MIYAGI 980,JAPAN

来源：

SURFACE SCIENCE | 1992年 / 271卷 / 03期

关键词：

D O I：

10.1016/0039-6028(92)90921-R

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Developments of a surface-analysis apparatus and techniques using a microelectron beam are described. These are based on ultra-high-vacuum scanning electron microscopy (UHV-SEM). Spatial resolution of the UHV-SEM was approximately 100 angstrom and micro-probe RHEED patterns can also be obtained. A one-dimensional display-type electron-energy-analyzer was developed and attached to the apparatus, with which an angle-resolved energy-analysis can be made at a constant (but changeable) take-off angle for azimuthal range of 75-degrees. Diffraction patterns of either Auger electrons or elastically scattered electrons can be obtained for a micro-region as probed by the mu-probe-beam. These diffraction techniques can be used for the determination of surface structure of a region as small as approximately 0.1 x 1-mu-m2. These techniques are applied to indium adsorption on Si(111) surfaces.

引用

页码：596 / 604

页数：9

共 13 条

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