SURFACE KINETICS OF ADATOMS IN VAPOR-PHASE EPITAXIAL-GROWTH OF SIC ON 6H-SIC(0001) VICINAL SURFACES

被引:169
作者
KIMOTO, T
MATSUNAMI, H
机构
[1] Department of Electrical Engineering, Faculty of Engineering, Kyoto University
关键词
D O I
10.1063/1.356439
中图分类号
O59 [应用物理学];
学科分类号
摘要
Growth of SiC on off-oriented 6H-SiC{0001} substrates was quantitatively analyzed based on the theory proposed by Burton, Cabrera, and Frank (BCF theory). By measuring the critical growth conditions where the growth mode changed from step-flow to two-dimensional nucleation, the surface diffusion lengths of adatoms on 6H-SiC(0001)Si and (000 $$($) over bar 1)C faces were calculated with the model. Although the nucleation rate was much higher on (000 $$($) over bar 1)C faces, the surface diffusion length was longer on (000 $$($) over bar 1)C faces. This brought about little difference in the step-flow growth condition on both faces. Growth conditions where step-flow growth takes place were predicted as a function of growth parameters such as temperature, growth rate, and off-angle of substrates. The analysis on off-angle dependence of growth rate revealed that desorption of adatoms was negligible and the condensation coefficient of supplied species onto the surface was almost unity on substrates with off-angles of more than 3 degrees.
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页码:850 / 859
页数:10
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