Deposition of PbTiO3 thin films from thd-complexes by an aerosol source MOCVD method

被引：8

作者：

Korsakov, IE

Kaul, AR

Klippe, L

Korn, J

Krause, U

Pulver, M

Wahl, G

机构：

[1] Chemistry Dept., Moscow State Lomonosov-University, 119899 Moscow

[2] Institut für Oberflächentechnik und plasmatechnische Werkstoffentwicklung, TU Braunschweig, D-38108 Braunschweig

来源：

MICROELECTRONIC ENGINEERING | 1995年 / 29卷 / 1-4期

关键词：

D O I：

10.1016/0167-9317(95)00146-8

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Evaporation rates of lead, titanium, zirconium and lanthanum thd-precursors and deposition rates of corresponding single oxides were measured by using a microbalance setup. Epitaxial-like PbTiO3 thin films on MgO (100) substrates and heterostructures PbTiO3/In2O3/MgO (100) were deposited by an aerosol source CVD technique.

引用

页码：205 / 208

页数：4

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