EFFICIENT INJECTION-LOCKING OF AN E-BEAM-EXCITED XEF LASER

被引：9

作者：

WEST, JB

KOMINE, H

STAPPAERTS, EA

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1981年 / 52卷 / 08期

关键词：

D O I：

10.1063/1.329400

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：5383 / 5385

页数：3

共 8 条

[1] TABLE-TOP AR-N2 LASER [J].

AULT, ER .

APPLIED PHYSICS LETTERS, 1975, 26 (11) :619-620

[2] HIGH-POWER XENON FLUORIDE LASER [J].

AULT, ER ;

BRADFORD, RS ;

BHAUMIK, ML .

APPLIED PHYSICS LETTERS, 1975, 27 (07) :413-415

[3] LASER INJECTION LOCKING [J].

BUCZEK, CJ ;

FREIBERG, RJ ;

SKOLNICK, ML .

PROCEEDINGS OF THE IEEE, 1973, 61 (10) :1411-1431

[4] INFLUENCE OF DILUENT GAS ON XEF LASER [J].

CHAMPAGNE, LF ;

HARRIS, NW .

APPLIED PHYSICS LETTERS, 1977, 31 (08) :513-515

[5] TEMPERATURE-DEPENDENT ABSORPTION PROCESSES IN THE XEF LASER [J].

CHAMPAGNE, LF .

APPLIED PHYSICS LETTERS, 1979, 35 (07) :516-519

[6] INJECTION LOCKING OF A XENON FLUORIDE LASER [J].

GOLDHAR, J ;

DICKIE, J ;

BRADLEY, LP ;

PLEASANCE, LD .

APPLIED PHYSICS LETTERS, 1977, 31 (10) :677-679

[7] THEORETICAL-ANALYSIS OF ELECTRICALLY EXCITED KRF LASER [J].

LACINA, WB ;

COHN, DB .

APPLIED PHYSICS LETTERS, 1978, 32 (02) :106-108

[8] CONTROL OF XEF LASER OUTPUT BY PULSE INJECTION [J].

PACALA, TJ ;

CHRISTENSEN, CP .

APPLIED PHYSICS LETTERS, 1980, 36 (08) :620-623

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